| 发明名称 |
Preparation of novel silicon-containing photoresists for use in IC microlithography |
| 摘要 |
Silicon containing copolymers are mixed with diazonaphthoquinone esters to give UV photoresists for use in microlithography on integrated circuits (IC). The copolymer structure has a thermally resistant group, N-(4-hydroxyphenyl)maleimide, and an oxygen plasma resistant group, para-trialkylsilylstyrene.
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| 申请公布号 |
US5262500(A) |
申请公布日期 |
1993.11.16 |
| 申请号 |
US19910781616 |
申请日期 |
1991.10.23 |
| 申请人 |
TATUNG CO. |
发明人 |
CHIANG, WEN-YEN;LU, JIN-YUH |
| 分类号 |
C08F8/00;C08F8/12;C08F222/40;G03F7/075;(IPC1-7):C08F222/40;C08F230/08 |
主分类号 |
C08F8/00 |
| 代理机构 |
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