发明名称 Dünnschichtmusterstruktur.
摘要 <p>A conductive pattern is formed by laser scribing of a conductive thin film formed on a soda-lime glass substrate suitable for liquid crystal devices. A first ion blocking film interposed between the glass substrate and the conductive pattern has its integrity disrupted by the laser scribing and to remedy this a second ion blocking film is provided over the structure. The second ion blocking film serves to inhibit the drift of sodium ions from the substrate through the laser scribed pattern formed in the first ion blocking film and the conductive film.</p>
申请公布号 DE68909620(D1) 申请公布日期 1993.11.11
申请号 DE1989609620 申请日期 1989.01.06
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD., ATSUGI, KANAGAWA, JP 发明人 YAMAZAKI, SHUNPEI, SETAGAYA-KU TOKYO, JP
分类号 G02F1/1333;G02F1/1343;H01L31/0224;H01L31/0392;(IPC1-7):G02F1/133;H01L31/02 主分类号 G02F1/1333
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