发明名称 |
Method of providing an ohmic contact on a ZnSe layer. |
摘要 |
Method of providing an ohmic contact on a ZnSe layer (2) provided on a substrate (1) by wetting the layer with a Hg containing liquid and heating the layer to a temperature in excess of 200 DEG C. The layer of ZnSe (2) is wetted and heated by immersing the substrate in a Hg containing bath heated to a temperature in excess of 200 DEG C but not greater than 350 DEG for a time greater than 120 minutes. The method can be used to make an ohmic contact on a p-type, nitrogen doped layer of ZnSe. After a time greater than 120 minutes a contact layer is formed on the layer which consists of HgxZn1-xSe, in which x varying from 0 at the surface of the ZnSe layer to 1 at the outer surface of the contact layer. The layer grown forms an ohmic contact to a layer of nitrogen doped ZnSe. <IMAGE> |
申请公布号 |
EP0569094(A1) |
申请公布日期 |
1993.11.10 |
申请号 |
EP19930201261 |
申请日期 |
1993.05.04 |
申请人 |
PHILIPS ELECTRONICS N.V. |
发明人 |
TASKAR, NIKHIL;KHAN, BABAR |
分类号 |
H01L21/28;H01L21/445;H01L33/00;H01L33/28;H01L33/40 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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