发明名称 Method of manufacturing a thin-film pattern on a substrate
摘要 Disclosed is an improvement in a thin-film pattern manufacturing method which includes the steps of providing a thin film on a substrate, forming a mask having a desired pattern on the thin film, and patterning the thin film by removing an exposed portion of the thin film by etching. According to the improvement, the mask is manufactured by forming a layer of an organic resin on the thin film on the substrate and by forming the organic resin layer in the desired pattern by a mechanical forming member. In another embodiment, the organic resin is directly formed or moulded on the thin film by a forming or moulding member.
申请公布号 US5259926(A) 申请公布日期 1993.11.09
申请号 US19920950286 申请日期 1992.09.24
申请人 HITACHI, LTD. 发明人 KUWABARA, KAZUHIRO;MORI, YUJI;MIKAMI, YOSHIRO
分类号 C23F1/00;G03F7/00;G03F7/26;H01L21/027;H01L21/033;H01L21/302;H01L21/3065;H05K3/06;(IPC1-7):B44C1/22 主分类号 C23F1/00
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