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发明名称
AUTOMATIC IMMERSION AND TREATMENT APPARATUS FOR SEMICONDUCTOR SUBSTRATE
摘要
申请公布号
JPH05291236(A)
申请公布日期
1993.11.05
申请号
JP19920115424
申请日期
1992.04.08
申请人
NEC CORP
发明人
SEO YUJI
分类号
H01L21/304;H01L21/306;H01L21/316;(IPC1-7):H01L21/306
主分类号
H01L21/304
代理机构
代理人
主权项
地址
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