| 摘要 |
PURPOSE:To provide an electrodeposition cell composition for photoresist stable for a long time, low in malordor and difficult to generate pinhole or the remaining of development by making it contain a specific solvent. CONSTITUTION:AT least one kind of the solvents expressed by formulas I, II or the like is incorporated. In the formula I, each of R1-R4 is hydrogen atom or a 1-5C alkyl group (where, at least one of R1-R4 is an alkyl group), R5 is a 1-5C alkyl group, (n) is an integer of 2-6. In the formula II, each of R6-R9 is hydrogen atom or a 1-5C alkyl group, R10 is a compound expressed by formula III (where, R12 is a 1-5C alkyl group). R11 is a compound expressed by formula IV or a 1-5C alkyl group, (m) is an integer of 1-5. Thus, when the specific solvent is blended into the electrodeposition cell composition, a resist pattern low in malordor, capable of electrodeposition coating for a long time and difficult to generate pinhole and the remaining of development is formed. |
