发明名称 MANUFACTURE OF YTTRIA-STABILIZED ZIRCONIA FILM
摘要 PURPOSE:To form a dense and uniform YSZ film easily at a low cost by applying ultrasonic waves to material solution to form fine grains, and heat- decomposing obtained aerosol by atomizing it to a high temperature substrate heated by infrared rays. CONSTITUTION:Zirconium is mixed with solution of metal soap of yttrium to form material solution, and ultrasonic waves are applied to the material solution to form fine grain for obtaining aerosol. The obtained aerosol is atomized to a high temperature substrate placed on a metal plate heated by infrared rays as carrier gas to be heat-decomposed instantaneously. These film forming work is all performed under an atmospheric pressure, and because other parts than the substrate are in constitution to be actuated under a room temperature, a dense and uniform yttria-stabilized zirconia(YSZ) film can be formed easily at a low cost. The organic metal soap is preferably octylic acid, naphthenic acid, neodecanic acid, ethyl hexanic acid, propionic acid, stearate, or acethyl acetoacetic acid.
申请公布号 JPH05290861(A) 申请公布日期 1993.11.05
申请号 JP19920119654 申请日期 1992.04.13
申请人 TOKYO GAS CO LTD 发明人 MATSUZAKI YOSHIO
分类号 H01M8/02;H01M8/12 主分类号 H01M8/02
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