| 摘要 |
<p>PURPOSE:To prevent deterioration of durability and position strain of a membrane, by a method wherein resistance to the membrane is reduced by decreasing air resistance by making gas between a mask and a wafer rapidly escape at the time of X-ray exposure. CONSTITUTION:Holes 4, 5, 6 or trenches are formed in at least one out of a support ring 1 and a wafer 2 retaining a membrane 3, in an X-ray mask.</p> |
