发明名称 Electroplating or electrolysis DC supply - has separately locatable voltage regulating unit and bath current unit
摘要 Electroplating or electrolysis d.c. supply arrangements are claimed, in which a variable output alternating voltage is adjusted by a regulator (regulating transformer or thyristor regulator) forming the a.c. side and is fed to the current transformer of the d.c. side. In one arrangement, the regulator is designed and located as a separate regulating unit, the current transformer and its rectifying diodes are designed and located as a separate bath current unit, and medium voltage lines are connected between the regulating unit output and the bath current unit input for power transmission. USE/ADVANTAGE - The d.c. supplies are useful for electroplating and other electrolytic (e.g. metal electrowinning) processes. The rectifying arrangement is divided into two separate and separately locatable units (i.e. the regulating unit and the bath current unit) so that the bath current unit can be located at the electrolysis cell where it takes up less space and allows short busbars or cables to be used.
申请公布号 DE4213834(A1) 申请公布日期 1993.11.04
申请号 DE19924213834 申请日期 1992.04.29
申请人 SCHERING AG BERLIN UND BERGKAMEN, 13353 BERLIN, DE 发明人 HUEBEL, EGON, 8501 FEUCHT, DE
分类号 H02P13/06;(IPC1-7):H02M7/06;C25D5/18;C25D19/00;H02P13/00 主分类号 H02P13/06
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