| 摘要 |
<p>PURPOSE:To stably manufacture the phase shift photomask having fixing and high resolving power at a low cost by restoring a phase shifter layer which causes the deterioration in properties, such as silanolization, by a post treatment, such as heating. CONSTITUTION:The phase shifter material is restored to the original film quality and refractive index by a laser beam, UV light or heating treatment 40 when the change in the film quality and refractive index of the phase shifter 35 layer is detected by a defect inspection after the formation of a transparent layer in the process for production of the phase shift photomask which forms the phase shifter patterns 35 by forming the transparent layer 33 and patterning this layer. The phase shift photomask is completed simply by increasing the simple state of full-surface irradiation with the laser beam or UV light or heating of the photomask. The assurance of phase differences, the improvement in a yield rate and the reduction of a cost are attained.</p> |
