发明名称 FORMATION OF THIN FILM AT END FACE OF OPTICAL WAVEGUIDE MEMBER
摘要 PURPOSE:To exactly and easily form a thin film consisting of a photoresist on either of the end face of an optical transmission path in which incident light propagates and an end face exclusive of the optical transmission path at the end face of an optical waveguide member such as optical fiber or optical waveguide substrate. CONSTITUTION:The photoresist is applied on one end face of the optical fiber 11 and irradiation light for exposing is made incident from the other end face, by which this light is propagated in a core 11b. Only the photoresist existing on the end face of the core 11b is exposed by this light emitted from the end face. An exposed part 14a and an unexposed part 14b are formed on the applied photoresist by utilizing the core 11b in such a manner, by which the thin film consisting of the photoresist is selectively formed on the end face of the optical fiber 11.
申请公布号 JPH05281434(A) 申请公布日期 1993.10.29
申请号 JP19920079860 申请日期 1992.04.01
申请人 发明人
分类号 G02B6/02;G02B6/10;G02B6/12;G02B6/122;G02B6/13;G02B6/26;G02B6/30;(IPC1-7):G02B6/26 主分类号 G02B6/02
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