| 摘要 |
PURPOSE:To provide a title equipment improved in exposure precision by controlling the swing speed of a Be window and that of toroidal X-ray mirror at the same time to correct exposure ununiformity. CONSTITUTION:An SOR ring 1 as a high-intensity SOR (synchrotron radiation X rays) light generating source is provided as well as an ultrahigh vacuum beam line 2 which extracts SOR light from this SOR ring, and toroidal X-ray mirror 3 is installed which condenses and reflects SOR light in this beam line and swings to enlarge exposure light area. A Be (beryllium) window 4 which swings in synchronization with the swing of the toroidal X-ray mirror, extracts X rays, and exposes a masked wafer to light is arranged at the terminal of a beam line, and a control circuit 7 is provided which the swing speed of this Be window and that of this toroidal X-ray mirror are multiplied by the reciprocal of an estimated rate of changes in SOR light intensity and at the same time corrects exposure ununiformity. |
