| 摘要 |
PURPOSE:To obtain an electrodeposition coating bath having good electrodeposition property by using a negative electrodeposition coating resin compsn. containing a specified component, and to obtain a resist pattern of high resolution without incomplete development by using this bath. CONSTITUTION:This electrodeposition coating resin compsn. consists of a resin, nonwater-soluble photopolymn. initiator, and compd. expressed by formula I and/or II. This resin is prepared by neutralizing a photopolymerizable resin having photoreactive unsatd. groups in the side chain, 20-300 acid value and 400-50000 number average mol.wt. with a basic org. compd. In formulae I and II, R1 is a hydrogen atom, halogen atom, hydroxyl group, alkyl group, alkoxy group, etc., R2 is a hydrogen atom, hydroxyl group, alkyl group, phenyl group, etc., Y is carboxyl group or its salt or sulfonic acid group or its salt, and (n) is an integer 1-3. An electrodeposition coating film is formed on a conductive base body in an electrodeposition coating bath which uses this resin compsn. The coating film is then exposed and developed to obtain a resist pattern. |
