| 摘要 |
PURPOSE:To provide an electrodeposition coating bath having good electrodeposition property by using a negative electrodeposition coating resin compsn. containing a specified component, and to provide a resist pattern of high resolution without incomplete development by using this bath. CONSTITUTION:This electrodeposition coating resin compsn. consists of polymers, nonwater-soluble monomers having two or more photopolymerizable unsatd. bonds in the molecule, nonwater-soluble photopolymn. initiator, and compd. expressed by formula I or II. The polymers are prepared by neutralizing polymers having 20-300 acid value obtd. by copolymn. of acrylic acids and/or methacrylic acids with a basic org. compd. In formulae I and II, R1 is a hydrogen atom, halogen atom, hydroxyl group, alkyl group, or alkoxyl group, R2 and R4 are hydrogen atoms, hydroxyl groups, alkyl groups, phenyl groups, etc., Y is a sulfonic acid group or its salt, and (n) is an integer 1-3. An electrodeposition coating film is formed on a conductive base body in an electrodeposition coating bath made of this resin compsn. The coating film is then exposed and developed to obtain a resist pattern. |
