| 摘要 |
PURPOSE:To obtain an electrodeposition coating bath having good electrodeposition property by using a negative electrodeposition coating resin compsn. containing a specified component, and to obtain a resist pattern of high resolution without incomplete development by using this bath. CONSTITUTION:This electrodeposition coating resin compsn. consists of polymers, nonwater-soluble monomers having two or more photopolymerizable unsatd. bonds in the molecule, nonwater-soluble photopolymn. initiator, and compd. expressed by formula and/or salt of this compd. with a basic compd. The polymers are prepared by neutralizing polymers having 20-300 acid value obtd. by copolymn. of acrylic acids and/or methacrylic acids with a basic org. compd. In formula, X is a carboxyl group or sulfonic acid group, R1 is a hydrogen atom, alkyl group, or phenyl group, and R2 is a hydrogen atom or methyl group. An electrodeposition coating film is formed on a conductive base body in an electrodeposition coating bath which uses this resin compsn. The coating film is then exposed and developed to obtain a resist pattern. |
