发明名称 Reinigungsvorrichtung für Halbleiterplättchen
摘要 A semiconductor wafer cleaning apparatus provided with an ice making unit and a jet nozzle for ejecting fine ice particles against a wafer held within a cleaning vessel includes an exhaust chamber having an expanded portion and connected to the cleaning vessel. Curved guide plates extend from cleaning vessel into the exhaust chamber equidistant from each other into the expanded portion to guide the jet particles into the expanded portion. A flow regulator plate having a multitude of inverted frustum-shaped tapered holes regulates the jetted particles within the cleaning bath in accordance with the downward flow direction. Further, the upward flow from the exhaust chamber along the side walls is caught by stopper plates and exhausted via exhaust ports.
申请公布号 DE4125195(C2) 申请公布日期 1993.10.28
申请号 DE19914125195 申请日期 1991.07.30
申请人 MITSUBISHI DENKI K.K., TOKIO/TOKYO, JP 发明人 ONO, TOSHIKI, ITAMI, HYOGO, JP;YAMASAKI, SHIRO, ITAMI, HYOGO, JP;NOGUCHI, TOSHIHIKO, FUKUOKA, JP
分类号 H01L21/304;H01L21/00;(IPC1-7):H01L21/30;B24C3/02;C30B33/00;C30B35/00 主分类号 H01L21/304
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