发明名称 Mehrschichtstruktur und Herstellungsverfahren.
摘要 A multi-layer structure that includes a transparent dielectric substrate, a layer of a nickel-containing steel alloy, and a layer of copper and/or chromium. The structure is used as multi-density photomasks for example. The process for fabricating multi-layer structure, like a multi-density photomask comprises: a) providing a transparent dielectric substrate having a steel layer and a layer of a metal, like of copper, thereon with the layer of said steel is deposited on top of said layer of a metal or vice versa; b) providing a layer of photoresist material on top of the structure provided in step (a); c) exposing and developing said layer of photoresist material; d) selectively etching exposed portion of said metal or said steel; e) selectively etching exposed portion of said metal or said steel not etched in step (d); f) exposing and developing photoresist on the said layer of said metal or said steel etched in step (d); g) selectively etching exposed portion of said metal or said steel of step (f); and h) removing the photoresist. t
申请公布号 DE3785322(T2) 申请公布日期 1993.10.28
申请号 DE19873785322T 申请日期 1987.12.23
申请人 INTERNATIONAL BUSINESS MACHINES CORP., ARMONK, N.Y., US 发明人 FLAGELLO, DONIS GEORGE, RIDGEFIELD, CONN. 06877, US;SHAW, JANE MARGARET, RIDGEFIELD, CONN. 06877, US;WITMAN, DAVID FRANK, PLEASANTVILLE, N.Y. 10570, US
分类号 G03F1/00;G03F1/54;H01L21/027 主分类号 G03F1/00
代理机构 代理人
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