PROCESS FOR FORMING SILICON OXIDE FILM,申请号EP19920901439-传众专利搜索

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发明名称	PROCESS FOR FORMING SILICON OXIDE FILM
摘要
申请公布号	EP0519079(A4)	申请公布日期	1993.10.27
申请号	EP19920901439	申请日期	1991.12.19
申请人	FUJITSU LIMITED;FUJITSU VLSI LIMITED	发明人	TSUKUNE, ATSUHIRO;FURUMURA, YUJI;HATANAKA, MASANOBU
分类号	H01L21/312;H01L21/316;H01L21/768;(IPC1-7):H01L21/312	主分类号	H01L21/312
代理机构		代理人
主权项
地址

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