Mask and charged particle beam exposure method using the mask,申请号US19920896715-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	Mask and charged particle beam exposure method using the mask
摘要
申请公布号	US5256881(A)	申请公布日期	1993.10.26
申请号	US19920896715	申请日期	1992.06.10
申请人	FUJITSU LIMITED	发明人	YAMAZAKI, SATORU;YASUDA, HIROSHI;SAKAMOTO, KIICHI
分类号	H01L21/027;H01J37/317;H01L21/30;(IPC1-7):H01J37/302	主分类号	H01L21/027
代理机构		代理人
主权项
地址

您可能感兴趣的专利

METHOD OF OBTAINING TETRA-AZA-MACROTOCYCLES

IMPROVEMENTS RELATED TO TOILET BARS

GROUND MATERIAL DISPLACING ASSEMBLY FOR USE IN TUMBLING MILLS

METHOD OF OBTAINING POTASSIUM SALTS OF HIGH PURITY

AUTOMATIC BRAKING MECHANISM FOR A MINING DRAWING MACHINE

DRIVE TRANSMISSION SYSTEM FOR A HOISTING CRANE

APPARATUS FOR DETERMINING STRAIN AND MODULUS OF RIGIDITY OF MIXES CONSISTING OF BITUMINOUS AND MINERAL MATERIALS

CONVEYOR BELT CLEANING SCRAPER

METHOD OF OBTAINING A YEAST PROTEIN HYDROLYSATE

MEASURING CABLE CONNECTION

OURDOOR WALL-MOUNTED LAMP

SWINGING OUTRIGGER OF A FLUID-TIGHT ENCLOSURE FOR CABLE TERMINALS

LIGHTING FITTING IN PARTICULAR THAT FOR COMPACT LIGHT SOURCES

UNION PIECE FOR ADJUSTING MOUNTING LENGTH OF A WATER-SUPPLY GATE VALVE

BIOPSY INSTRUMENT INCLUDING TIP FOR TISSUE DILATION

METAL DIAPHRAGM TYPE VALVE

Endodontic device and method for applying filler material to root canals