发明名称 Cooled plasma source
摘要 A cooled plasma source for producing ions by electrical discharge. A cooled plate is positioned in the chamber of the plasma source for blocking thermal radiation from an electron-emitting cathode. The presence of the cooled plate results in significantly decreased substrate temperatures, as compared to use of conventional plasma source apparatus. As a result, the cooled plasma source may be used for treatment of heat-sensitive plastic substrates.
申请公布号 US5256930(A) 申请公布日期 1993.10.26
申请号 US19920833049 申请日期 1992.02.10
申请人 COMMONWEALTH SCIENTIFIC CORPORATION 发明人 HUGHES, WILLIAM E.
分类号 H01J27/02;H05H1/24;(IPC1-7):H05H1/28;H01J7/24;H05H1/54 主分类号 H01J27/02
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