| 摘要 |
PURPOSE:To reduce the irregularity of light resistance of a photoelectric element and to improve the yield of the photoelectric element by forming an electrode by a mask formed to reduce the light resistance at a photoelectric element and trimming improper electrode in a step of selecting the light resistance thereof to proceed it to next step. CONSTITUTION:A stock is mixed and calcined in a step of fabricating a photoelectric element 2, and the obtained element is identified as to preceding quality by a sampling lot inspection. Then, the element is evaporated with electrodes. At this time the electrodes 1, 1 are formed with a mask so formed as to reduce in advance the light resistance on the element 2. The outside from the broken line is retained as trimming space 3, so that the effective area thereof between the electrodes 1 and 1 may be reduced by approx. 30-40%. The light resistance of the elements 2 thus formed with the electrodes 1, 1 is selected and sorted to trim the improper electrodes 1, 1. Thereafter, a base 4 is mounted on the lower surface of the element 2, lead wires 5 are connected thereto, and dried. |
