发明名称 METHOD AND APPARATUS FOR REMOVING UNNECESSARY COATING FILM AND PRODUCTION OF PHASE SHIFT MASK BLANK
摘要 <p>PURPOSE:To certainly remove an unnecessary coating film formed to an unnecessary place like the surface peripheral edge part other than the surface principal part of a substrate and the side surface part and rear part of the substrate in a relatively easy manner. CONSTITUTION:A substrate 10 is received in and placed on the recessed placing part 21 of a rotary spin chuck 20 in such a state that the rear thereof is turned upwardly and a solvent 40 capable of dissolving a coating film is supplied to the substrate 10 from above while the spin chuck 20 is rotated at the first number of rotations. By this method, the solvent 40 is supplied to the unnecessary coating films formed on the surface peripheral edge part 11c, side surface part 11d and rear part 11e of the substrate to dissolve the unnecessary coating films. Next, the spin chuck 20 is rotated at the second number of rotations larger than the first number of rotations to scatter the solvent 40 by centrifugal force to remove the unnecessary coating films. By this constitution, the unnecessary coating films can be certainly removed in a relatively easy manner.</p>
申请公布号 JPH05277424(A) 申请公布日期 1993.10.26
申请号 JP19920077277 申请日期 1992.03.31
申请人 发明人
分类号 B05C9/12;B05C11/08;B05D1/40;B05D3/00;B05D3/10;G02B5/20;G03F1/26;G03F1/68;G11B5/842;H01L21/027;H01L21/304;(IPC1-7):B05C11/08;G03F1/08 主分类号 B05C9/12
代理机构 代理人
主权项
地址