发明名称 Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
摘要 A process for converting a normally positive working photosensitive composition to a negative working composition is disclosed. One forms a composition containing an alkali soluble resin, a 1,2 quinone diazide-4-sulfonyl compound and an acid catalyzed crosslinker in a solvent mixture. After drying and imagewise exposing, the composition is baked and developed to produce a negative image. The image-reversal negative-working photoresists of this invention have superior storage stability and shelf life.
申请公布号 US5256522(A) 申请公布日期 1993.10.26
申请号 US19910815645 申请日期 1991.12.30
申请人 HOECHST CELANESE CORPORATION 发明人 SPAK, MARK A.;MAMMATO, DONALD;DURHAM, DANA;JAIN, SANGYA
分类号 G03F7/022;G03F7/20;G03F7/38;(IPC1-7):G03F7/30 主分类号 G03F7/022
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