| 摘要 |
PURPOSE:To prevent the defective development of a photosensitive material, especially a negative type photosensitive lithographic printing plate by the lapse of time by adding N-heterocyclic carboxylic acid to a photosensitive composition by a specified amount based on the amount of photosensitive diazo resin and by applying the composition to a support. CONSTITUTION:N-heterocyclic carboxylic acid is added to a photosensitive composition by 1-100wt%, preferably 10-50wt% of the amount of photosensitive diazo resin and the composition is applied to a support. Diazo resin soluble in an org. solvent is especially suitable for use as the photosensitive diazo resin and the resin may be composed of p-diazodiphenylamine and formaldehyde. The N-heterocyclic carboxylic acid added is an N-heterocyclic compound having at least one carboxyl group and is preferably soluble in an org. solvent. |
