| 摘要 |
PURPOSE:To stably retain a low surface tension at a high temperature by using a specific fluorine surfactant. CONSTITUTION:In the formula, R<1> represents a fluoroalkyl group having 3 or more carbon atoms and R<2>, a hydrogen atom or lower alkyl group having 1-4 carbon atoms. Respective R<3>, R<4> and R<5> independently represent a lower alkyl group having 1-4 carbon atoms or aryl group or aralkyl group having one benzene ring. X represents a halogen or acid radical and m, the integer from 1 through 10. The fluoroalkylsulfonamide is contained in sulfuric acid so as to be made into a sulfuric acid composition. Thus, the sulfuric acid composition is small in the contact angle to a silicon wafer because of its low surface tension and therefore excellent in wettability and can display a satisfactory cleaning effect. |
