| 摘要 |
PURPOSE:To prevent focus performance of projection optical system from deteriorating by disposing an optical element for correcting chromatic aberration and magnification chromatic aberration of alignment light in a projection optical system in a region where an image is not superposed directly thereon. CONSTITUTION:A correction optical system element 1 is disposed on the outside of a region in which an image is formed directly. A transparent member 5 formed with the correction optical element is arranged on the pupil surface of a projection optical system 21, and the image of a pattern formed in a rectangular exposure area 7 of the reticle 6 is transferred to resist on a wafer 9. When an alignment mark in a region C2 adjoining one of four sides surrounding the exposure area 7 of the reticle 6 is employed, three correction optical elements 1a-1c on the transparent member 5 is used. Alignment mark in region C is then irradiated with two alignment light fluxes 4a, 4b through an alignment microscope 11. The light fluxes 4a, 4b are impinged, respectively, onto correction optical systems 1a, 1b mounted on the transparent member 5 in the projection optical system 21 thus performing aberration correction. |
