| 摘要 |
<p>PURPOSE:To enable the defect inspection of the phase shift mask of a chromiumless type by providing a light shielding pattern along the edges of the phase shifter formed on a glass substrate. CONSTITUTION:The phase shifter 3 having, for example, a rectangular pattern, is formed within the effective exposing region on the transparent glass substrate 2 consisting of synthetic quartz having about 1.47 refractive index. The phase shifter 3 is obtd. by patterning the spin-on glass film deposited over the entire surface of the glass substrate 2. The light shielding pattern 4 of a narrow width is formed along the edges of the phase shifter 3 on the glass substrate 2. The light shielding pattern 4 consists of a light shielding film of chromium or chromium oxide. The optical image obtd. by irradiating the phase shift mask 1 with light is the image of the high contrast of the edge (light shielding part) of the phase shifter 3 and the other part (light transmissive part). Then, the comparison of this optical image and the electrical image formed from design data is enabled.</p> |
