| 摘要 |
PURPOSE:To provide the inspecting method for a reticule/mask which deceases pseudo defects and improves detection sensitivity. CONSTITUTION:This inspecting device is constituted by including a stage 11 on which the reticule 16 having plural chip patterns 17a, 17b formed with internal patterns of the same shape is placed, a light source 12 which generates the light to be cast to the reticule 16, an optical system 13 which introduces the light transmitted through the reticule 16 on the stage 11 to a sensor 14, the sensor 14 which detects the light transmitted through the optical system 13 and converts the light to an electric signal, a storage means 18 which stores the electric signal generated from the sensor 14 and a detecting means 15 which compares the electric signal stored in the storage means 18 and the electric signal freshly generated from the sensor 14 and detects an abnormal signal. |
