| 摘要 |
PURPOSE:To provide a reflection film consisting of an Al alloy having good quality by maintaining an atmosphere mixture composed of argon and nitrogen as the atmosphere in a sputtering chamber. CONSTITUTION:The inside of a vacuum vessel 10 is discharged by a discharge device 13 down to, for example, 3/1000000Torr. The gaseous argon and gaseous nitrogen are then introduced into the vessel 10 so as to attain prescribed mixing ratios to maintain 3/1000Torr in the vessel 10. Further, the gas mixing ratios are gradually changed and the sputtering is executed by using Al-3atom% Zr, Al-2atom% Mo, Al-2atom%, Zr-1atom% Mo alloys, by which the Al alloy film is formed. The formation of the Al alloy film as a reflection layer is well executed when the ratio of mixing the nitrogen with the gaseous argon is <=20%. |
