| 摘要 |
PURPOSE:To form the light shielding patterns which have high flatness, do not generate wrinkles in spite of a treatment at a high temp., has an excellent light shielding property and is free form unevenness, by forming a photopolymerizable light shieldable material layer on a substrate and subjecting the layer to exposing and developing, thereby forming the light shielding patterns. CONSTITUTION:The photopolymerizable light shieldable material layer is formed directly on the substrate or on the substrate formed with single or plural picture element patterns and is subjected to exposing and developing, by which the light shielding patterns are formed; thereafter, the flatness is increased by side etching at need. The layer is then subjected to full-surface exposing through the substrate before the wrinkles by heat are generated. As a result, the multicolor light shielding patterns which can effectively prevent the generation of the wrinkles occurring in the failure in the sufficient arrival of the light sufficient at the inside at the time of the exposing and the low degree of polymn. in the apart further from the surface and has the high flatness is obtd. with the photopolymerizable light shieldable material layer colored black to be used at the time of forming the light shielding pattern. |
