| 摘要 |
PURPOSE:To provide a producing method of an optical waveguide film by which the optical waveguide film can be controlled to have uniform thickness in the substrate plane. CONSTITUTION:A turntable 11 has recesses on its surface and each recess contains a silicon wafer 12. The height h1 of the silicon wafer on which a glass film is to be formed and the height h2 of the turntable 11 satisfy the relation of -0.05mm<=h(=h1-h2)<=0.05mm. A heater 11a is embedded in the turntable 11 to heat the silicon wafer 12 to about 600 deg.C surface temp. |
