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发明名称
METHOD FOR FORMING SILICON OXIDE LAYER
摘要
申请公布号
JPH05267281(A)
申请公布日期
1993.10.15
申请号
JP19920062527
申请日期
1992.03.18
申请人
发明人
分类号
H01L21/316;(IPC1-7):H01L21/316
主分类号
H01L21/316
代理机构
代理人
主权项
地址
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