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经营范围
发明名称
Heizapparat für Halbleiter-Wafer.
摘要
申请公布号
DE3787367(D1)
申请公布日期
1993.10.14
申请号
DE19873787367
申请日期
1987.05.14
申请人
PROCESSING TECHNOLOGIES, INC. AG, SUNNYVALE, CALIF., US
发明人
GAT, ANITA S., PALO ALTO CALIFORNIA 94301, US;WESTERBERG, EUGENE R., PALO ALTO CALIFORNIA 94301, US
分类号
F27B5/14;F27D19/00;F27D99/00;H05B3/00;(IPC1-7):H05B3/00;C30B25/10;F27B17/00;C30B31/12
主分类号
F27B5/14
代理机构
代理人
主权项
地址
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