| 摘要 |
In a semiconductor double-chamber etching apparatus, this etching apparatus can be manually operated in a maintenance area by connecting the movable manual operation panel, with a communication means, to anyone of a plurality of relay stations provided to the etching apparatus installed facing to the maintenance area, without using the manual operation panel of the etching apparatus provided to a face of the etching apparatus facing to the clean room adjacent to the maintenance area, being separated by a partition wall. |
