发明名称 Vacuum vapour deposition equipment for coating substrates - with several magnetron cathode sets, each comprising a magnet pair, a screened target and aperture for a substrate
摘要 Vacuum vapour deposition equipment for coating substrates, using a cathode target (5) with electrical connection (7) mounted on a cooling plate (1) with electrical insulator (6) between target and cooling plate, a magnet set (9, 9') and target surrounding screening (2) with an aperture opening. Several targets (5) are mounted in one plane on the side of the cooling plate (1) facing the substrates, each target having an individual electrical connection and a substrate assigned to it. USE/ADVANTAGE - The equipment is used for vapour deposition coating of data storage devices, esp. magnetic discs, with a throughput substantially better than obtainable with single disc plants.
申请公布号 DE4211798(A1) 申请公布日期 1993.10.14
申请号 DE19924211798 申请日期 1992.04.08
申请人 LEYBOLD AG, 63450 HANAU, DE 发明人 REINECK, STEFAN, DR., 6306 LANGGOENS, DE;CORD, BERNHARD, DR., 8755 ALZENAU, DE
分类号 C23C14/35;G11B5/851;H01J37/34;(IPC1-7):C23C14/35;G11B5/85 主分类号 C23C14/35
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