| 摘要 |
This invention provides a positive photoresist composition comprising an alkali-soluble resin, a dissolution inhibitor and a photo-induced acid precursor, wherein said alkali-soluble resin is obtainable through a condensation reaction of a compound represented by the general formula (I): ( I ) wherein R1 to R9 each represent hydrogen atom, halogen atom, alkyl group, alkenyl group, -OH group or the like, provided that at least one of R1 to R9 is -OH group and at least two hydrogen atoms are attached to the o- or pposition of the -OH group, and an aldehyde. This positive photoresist composition is excellent in performances such as resolution, profile, sensitivity, etc.
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