| 摘要 |
PURPOSE:To provide the X-ray transfer mask having excellent thermal resistance and durability as well as no strain at all on a mask substrate. CONSTITUTION:In the X-ray transfer mask having a structure in which a mask substrate 1 comprising silicon carbide or silicon nitride thin film 2 and silicon carbide or silicon nitride ceramics made supporting frame 6 are jointed, after the evaporation of copper on respective junction surface 5 of the mask substrate 1 and the supporting frame 6, the X-ray transfer mask having excellent thermal resistance and durability as well as no strain at all on the mask substrate 1 capable of joining at low temperature by diffusion-junction step on load can be manufactured. |
