| 摘要 |
PURPOSE:To make an apparatus small-sized, to shut off an atmosphere in each treatment chamber and to enhance the throughput of the apparatus. CONSTITUTION:A connecting port 2 is formed at the lower part of a partition wall 20 which partitions adjacent treatment chambers 8f, 8g. The treatment chamber 8f is connected to the treatment chamber 8g. A treatment tank 23 which houses a treatment liquid L is arranged and installed inside both treatment chambers 8f, 8g so as to be capable of being moved. The treatment liquid L which is housed in the treatment tank 23 is brought into contact with the partition wall 20; both treatment chambers 8f, 8g are shut off. Thereby, the cleaning tank 23 inside both treatment chambers 8f, 8g can be used for both, an apparatus can be made small-sized as a whole and the consumption amount of the treatment liquid L can be reduced. Since the conveyance means of a wafer W is not required, the throughput of the apparatus can be enhanced.
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