| 摘要 |
PURPOSE:To obtain a photomask of high quality by forming an emulsion pattern on a transparent substrate outside the effective pattern region of a mask to prevent the emulsion mask and a hard mask from sticking. CONSTITUTION:Emulsion pattern 4' is formed entirely or partially on a transparent substrate outside frame pattern 3' showing the border of an activated region where element patterns 1', 2' of IC or the like are formed. When peripheral portion 4' alone of frame 3' is exposed to form a pattern, silver is deposited on the exposed portion, and the portion is slightly protruded from the unexposed portion. In order to transfer this pattern onto a hard mask for copy, both the masks are vacuum- contacted, and pattern 2' is exposed. When the masks are separated, by destroying the vacuum gas readily enters between the masks to prevent sticking since there is a height difference between unexposed portion 1' and exposed portions 2', 4'. Thus, the masks are easily separated and can be protected from contamination, breaking, etc. |
