发明名称 |
METHOD FOR MANUFACTURING A CAPACITOR |
摘要 |
A method of fabricating a capacitor for increasing capacitance is disclosed. The process includes the steps of forming a first storage node on the substrate where a transistor is formed thereon forming a first dielectric layer on the surface of the first storage node and on the predetermined portion of the impurity region of the transistor adjacent to first storage node, forming a common plate electrode on the first dielectric layer, forming a second dielectric layer on the surface of the common plate electrode, depositing a third polysilicon on the resultant and patterning a third polysilicon layer to form a second storage node. Capacitance is increased by connecting the capacitors parallel.
|
申请公布号 |
KR930009585(B1) |
申请公布日期 |
1993.10.07 |
申请号 |
KR19900020495 |
申请日期 |
1990.12.13 |
申请人 |
GOLDSTAR ELECTRON CO., LTD. |
发明人 |
HAN, JONG - SU;KIM, UN - SAN |
分类号 |
H01L27/04;H01L27/108;(IPC1-7):H01L27/108 |
主分类号 |
H01L27/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|