Plasma-aided coating of substrates - with a low-voltage arc discharge between a cathode and an anodic electrode

摘要

The plasma-aided coating process of substrates (4) by means of a vacuum arc evaporator is characterised by the following: a) a low-voltage arc discharge is ignited between a cathode and an anodic electrode (6) in an evacuated coating chamber (1); b) the substrates (4) are at a negative potential, so that they are subjected to ion and electron bombardment by the plasma of the low-voltage arc discharge; c) a target (18) made of a coating material has a negative potential relative to the electrode (6), and a vacuum arc discharge is ignited between the target and the electrode; d) both the low-voltage arc discharge and the vacuum arc discharge are maintained over the entire duration of the coating process. USE/ADVANTAGE - In surface coating technology. In comparison with known methods and installations, the invention allows the plasma density to be substantially increased.