| 摘要 |
<p>PURPOSE:To provide the semiconductor device which is produced without being contaminated by chemical contaminants to wafers and more particularly acidic gases, such as HCl, HF and SO2 and the process and apparatus for production of the device. CONSTITUTION:An air cleaning unit mounted with a gas adsorption filter 40 having a grating structure is provided between a fan 42 for taking the air of a clean room into the apparatus 20 for production of the semiconductor device and an HEPA filter 38. The air cleaned by the air cleaning unit is taken into the apparatus 20 for production. As a result, the concn. of the chemical contaminants in the air taken into the apparatus 20 for production is remarkably lowered and therefore, the semiconductor wafer is not contaminated by the chemical contaminants at the time of standing by and moving the semiconductor wafer, the active surface of which is exposed by the apparatus 20 for production. Then, the factors to contaminate the semiconductor wafer are removed from the semiconductor produced by using the apparatus 20 for production and therefore, the device defects are decreased.</p> |
