发明名称 ANALYSIS PRETREATING INSTRUMENT AND PRETREATING METHOD USING INSTRUMENT THEREOF
摘要 PURPOSE:To make it possible to adjust the sample for total-reflection fluorescent X-ray analysis by providing an outer tube having the end part, which can hold the droplet of sample liquid to be analyzed, so as to surround the end part of a capillary, concentrating the sample liquid, and drying and fixing the liquid in a small area at the specified position of a drying plate for the sample liquid to be analyzed. CONSTITUTION:A tip part 3 of a capillary 2 is washed. Sample liquid of about 200mul is sucked into the capillary 2 through the tip part 3. Then, a wafer is set at a specified position and heated to 90-95 deg.C. Then, the tip part 3 of the capillary 2, which has sucked the sample liquid, is moved to the specified position on the wafer. The tip part 3 is lowered to a specified interval for the wafer, and the sample liquid is discharged slowly. A small droplet is formed between the tip part 3 and the wafer. The diameter of the droplet becomes constant by adjusting the discharging speed of the liquid and the evaporating speed by heating. For example, when the discharging speed is be made to about 10mul/minute at the surface temperature of about 90-95 deg.C, the diameter of the droplet becomes about 2mm. The droplet is dried and fixed in the intact state. Thus, the sample liquid of the large amount of liquid can be dried and fixed in the minute area at the set position of a dying plate.
申请公布号 JPH05256749(A) 申请公布日期 1993.10.05
申请号 JP19920088144 申请日期 1992.03.12
申请人 发明人
分类号 G01N1/28;G01N23/223 主分类号 G01N1/28
代理机构 代理人
主权项
地址
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