发明名称 Solder interconnection structure
摘要 Solder interconnection whereby the gap created by solder connections between a carrier substrate and semiconductor device is filled with a composition obtained from curing a preparation containing a cycloaliphatic polyepoxide and/or curable cyanate ester or prepolymer thereof; filler having a maximum particle size of 31 microns and being at least substantially free of alpha particle emissions.
申请公布号 US5250848(A) 申请公布日期 1993.10.05
申请号 US19910737473 申请日期 1991.07.30
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CHRISTIE, FREDERICK R.;PAPATHOMAS, KOSTAS I.;WANG, DAVID W.
分类号 H01L21/56;H01L21/60;H01L23/29;H05K3/28;H05K3/34;(IPC1-7):H01L23/48;H01L29/40;H01L29/64;H01L39/02 主分类号 H01L21/56
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