发明名称 |
Electron beam lithography using an aperture having an array of repeated unit patterns |
摘要 |
An electron beam lithography apparatus is disclosed which has an aperture plate provided with an aperture including an array of repeated unit patterns and an ordinary aperture of a rectangular shape. A region free of the influence of a proximity effect is delineated using the former aperture, and a region affected by the proximity effect is delineated using the latter aperture. The number of repeated unit patterns included in the former aperture is determined considering the number of repeated unit patterns included in a pattern array to be delineated on a substrate. Thereby, the number of electron beam shots is reduced. A plurality of apertures having slightly different aperture widths may be provided for always keeping a pattern line width constant.
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申请公布号 |
US5250812(A) |
申请公布日期 |
1993.10.05 |
申请号 |
US19920858868 |
申请日期 |
1992.03.27 |
申请人 |
HITACHI, LTD. |
发明人 |
MURAI, FUMIO;OKAZAKI, SHINJI;YODA, HARUO;SHIBATA, YUKINOBU;TSUKIZOE, AKIRA |
分类号 |
H01J37/317;(IPC1-7):H01J37/04 |
主分类号 |
H01J37/317 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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