| 摘要 |
PURPOSE:To reduce the distance between a photosensitive element and a filter and to enable accurately positioning therebetween by coating and sensing a photosensitive thin film on the element. CONSTITUTION:An n<+>-type diffused region is formed in a p-type substrate 10 to form photodiodes 11-13. Then, an SiO2 film 14, a bonding pad 15, and a photosensitive thin film 16 are sequentially formed thereon. On the other hand, it is exposed with light and developed by a photomask formed with a red filter 18, a green filter 19, a blue filter 20, black filters 21-24 and a transparent region 25 in predetermined regions of one surface of a glass plate 17 to form filters on the photodiodes 11-13. |
