APPARATUS FOR EXPOSING PHOTORESIST IN CYLINDERS

摘要

A photoresist coating on a cylinder is exposed by placing a mask loosely inside the cylinder and then shining collimated light down the center of the cylinder and onto a conical mirror. The conical mirror reflects the light radially outward through the mask to expose the photoresist on the inner surface of the cylinder. Photoresist on the outside of the cylinder may also be exposed in the same manner by placing a conical mirror around the periphery of the cylinder. To expose the entire length of the cylinder, the conical mirror is moved gradually along the length of the cylinder.