发明名称 |
POLYPHOSPHAZENE BINDER RESINS FOR PHOTORESISTS COMPRISING AS PHOTOSENSITIZERS O-QUINONE DIAZIDE ESTERS |
摘要 |
This invention relates to novel radiation sensitive compositions. More particularly the invention relates to photoresists containing phosphorus and nitrogen linked polymers; i.e., polyphosphazenes, useful in the preparation of a relief pattern on a substrate; e.g., a silicon wafer or aluminum plate. The polyphosphazenes of in this invention can be synthesized by the condensation of N-trimethylsilylalkoxyphosphorimides. Radiation sensitive positive photoresist compositions of the invention can be developed in aqueous base developer or organic solvent developer The base developer dissolution properties of the composition can be controlled by incorporating carboxylate groups into the polyphosphazene. The polyphosphazenes utilized in this invention have good solubility properties in various organic solvents and also have good mechanical, electrical, adhesion and thermal properties.
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申请公布号 |
US5248585(A) |
申请公布日期 |
1993.09.28 |
申请号 |
US19910810634 |
申请日期 |
1991.12.18 |
申请人 |
HOECHST CELANESE CORPORATION |
发明人 |
LYNCH, THOMAS J.;DURHAM, DANA L.;SOBODACHA, CHESTER |
分类号 |
C08G79/02;G03F7/023 |
主分类号 |
C08G79/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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