| 摘要 |
PURPOSE:To obtain a manufacturing method for a transmission mask for block exposure enabling to enhance exposure precision by increasing strength of a mask part without making a pattern large in the mask part and hardly generating pattern blurring due to mask strain. CONSTITUTION:The manufacturing method is constituted so as to include the following processes; a process forming a groove 1a on a lower layer silicon substrate 1, a process forming a silicon oxide film 2 by thermally oxidizing over the whole lower layer silicon substrate 1 surface formed the groove 1a, a process embedding a filling member 3 for reinforcement in the groove 1a which the silicon oxide film 2 is formed on the surface part, a process stuck together the lower layer silicon substrate 1 and an upper layer silicon substrate 4, a process to form a mask pattern 4a on the upper silicon substrate 4 after a back surface of the lower layer silicon substrate 1 was opened. |
