| 摘要 |
PURPOSE:To obtain a projection exposing device the projecting performance of which can be adjusted with high reproducibility. CONSTITUTION:A CPU successively measures the positions on an image surface upon which the images of marks respectively formed at a plurality of prefixed positions on a reticle 5 are projected through a projection lens 6 by using laser interferometers 13 and 34, very small opening 8 formed through a stage 7, and a photoelectric detector 9. In addition, the CPU calculates the projecting magnification of the lens 6 or the value corresponding to the distortion aberration of the lens 6 based on the relative relation between each mark on the reticle 5 and previously measured position of each mark. After calculation, the CPU adjusts the position of partial optical elements (lenses) constituting the lens 6 based on the calculated value. |
